Materials (GaN, GaAs, etc.), Epi & Equipment channel!
CompoundSemi Online serves
the information needs of the compound semiconductor industry and its supply
chain with product and market news updates for this rapidly evolving technology.
Our "all the news on one page" format, with select channels for specific
interests, offer the most efficient news delivery approach in the industry.
If you're looking for LED
or Solid State Lighting News...
You're darn right they're part
of the compounds, but we're also proud to say that the LED segment has "graduated"
and can benefit from publications that are more dedicated to those topics. For
news on the broad LED industry, outside of general lighting, along with the
materials and technology supply chain, visit LIGHTimes
Online. For a higher level view of LEDs in general lighting, you can visit
Solid State Lighting Design,
which covers packaged "lighting quality" LEDs through subsystems,
luminaires and application stories.
Startup Allos Semiconductors now Offers Licensing for Azzurro's GaN-on-Si Patents and Technology
LIGHTimes News Staff
December 16, 2014...ALLOS Semiconductors GmbH, a newly founded company based in Dresden,
Germany, who specializes in GaN-on-Si technology, announced that it has
acquired all the patents and technology of former Azzurro Semiconductors at an
auction. In addition to its existing offering of GaN-on-Si technology ALLOS is
now making the AZZURRO technology platform available through technology
transfer, licencing and customised development work.
In June of 2014, ALLOS Semiconductors was formed to help meet the growing
demand for technology of growing gallium nitride on silicon substrates
(GaN-on-Si). An increasing number of LED and power semiconductor companies want
to be able to grow 150 and 200 mm GaN-on-Si wafers to supply cost-effective
high-quality GaN devices that can be processed in standard silicon fabs.
Allos complements the GaN-on-Si technology licensing with advice on business
and technology strategies and support for setting up GaN-on-Si operations all
the way from establishing a epitaxial wafer fab to market entry.
Cubic GaN Shows Potential for LEDs
LIGHTimes News Staff
December 16, 2014...Anvil Semiconductors and the Cambridge Centre for GaN at the University of
Cambridge report having grown cubic GaN on 3C-SiC (silicon carbide) wafers using
MOCVD. Anvil produced the underlying 3C-SiC layers using the company's patented
stress relief IP that enables growth of device quality silicon carbide on 100mm
diameter silicon wafers. Anvil contends that the process can work with 150mm
diameter wafers and possibly beyond without modification and is therefore
suitable for industrial-scale applications. In a project funded by Innovate UK,
the MOCVD growth trials at Cambridge resulted in single phase, cubic GaN. The
layers, characterized by XRD, TEM, photoluminescence and AFM, have potential
for LED applications.
According to the researchers, the cubic GaN may be able to remove the strong
internal electric fields, which plague conventional green LEDs, impair
recombination, and make it difficult to address high internal quantum
efficiency (IQE). Also, the researchers note that cubic GaN has a narrower
bandgap and improved p-type electrical properties compared to the conventional
hexagonal GaN phase used for LEDs. Therefore, a commercializable process to
produce cubic GaN on large diameter silicon wafers may help increase the
efficiency and reduce the cost of LED lighting.
The team plans to continue development to eventually fabricate sample LEDs
before looking for an industry partner to commercialize the technology.
Sanan Orders 50 MOCVD Reators from Veeco for LED Production
LIGHTimes News Staff
December 12, 2014...Veeco Instruments Inc. of Plainview, New York USA, announced that Sanan
Optoelectronics, the largest LED manufacturer in China, has ordered 50
TurboDisc® EPIK700™ Gallium Nitride (GaN) Metal Organic Chemical Vapor
Deposition (MOCVD) reactors for the production of LEDs. This order is the
equivalent of 25 EPIK700 MOCVD “C2” (cluster) systems.
“Sanan chose the EPIK700 due to its industry leading cost of
ownership model and excellent footprint efficiency,” said Zhiqiang
Lin, vice chairman and CEO of Sanan. “Our beta testing of EPIK700
proved its production-worthiness, and we are confident in its capabilities and
value to our Xiamen business expansion plans. Veeco has been a great partner
for Sanan as we have solidified our position as the top LED manufacturer in
China and increased our business outside of China as well.”
Veeco's EPIK700 MOCVD system uses the company's TurboDisc technology to
achieve a cost per wafer savings of up to 20 percent compared to previous
generation MOCVD systems. The savings comes through increased productivity,
improved wafer uniformity, and reduced operating expenses.
“This large order from Sanan, the largest single purchase order
Veeco has received since 2009, speaks volumes about the EPIK700’s
production readiness and the recovery in the MOCVD market,” said
John Peeler, Veeco’s chairman and CEO. “We are in a great
position to continue to serve our LED customers with the best MOCVD technology
and customer support, and remain the industry leader.”
EV Group Establishes Nanoimprint Lithography Competence Center
LIGHTimes News Staff
December 4, 2014...EV Group (EVG) based in St. Florian, Austria, a supplier of wafer bonding
and lithography equipment, announced that it has established the
NILPhotonics(TM) Competence Center. The NILPhotonics(TM) Competence Center
assists customers in leveraging EVG's suite of nanoimprint lithography (NIL)
solutions for new and enhance photonics products and applications including
LEDs and photovoltaic (PV) cells.
EVG says that in LEDs NIL-enabled photonic structures can improve light
extraction, and in PV cells NIL-enabled photonic structures can improve light
capturing. Additionally, NIL-enabled photonic structures in laser diodes enable
device characteristic tailoring and optimization to improve performance. The
Competence Center includes dedicated, global process teams, pilot-line
production facilities and services at its cleanrooms at EVG's headquarters in
Austria and its subsidiaries in Japan and North America.
EVG says that the new NILPhotonics Competence Center builds on the company's
more than 15 years of NIL experience and what the company claims to be the
largest installed base of NIL systems worldwide. EVG's NIL equipment portfolio
includes the recently introduced EVG7200 UV-NIL system, which supports EVG's
next-generation SmartNIL(TM) large-area soft NIL process for high-volume
manufacturing. The company boasts that the EVG7200 with SmartNIL provides
unmatched throughput and cost-of-ownership advantages over competing NIL
"Nanoimprint lithography is an enabling technology for the design and
manufacture of all kinds of photonic structures, which can significantly
shorten time to market and lower cost of production compared to conventional
technologies, such as electron-beam writing and stepper systems for optical
lithography," stated Markus Wimplinger, corporate technology development
and IP director at EV Group.
"For example, compared with conventional lithography, our full-wafer
nanoimprinting technology can pattern true three-dimensional structures in the
sub-micron to nano-range as well as features as small as 20 nm, which opens up
a range of new photonic applications.
With our NILPhotonics Competence Center, we're not just providing our
customers with the most advanced NIL systems; we're also working closely with
them during product development to help them determine how best to optimize
their product designs and processes to take advantage of the resolution and
cost-of-ownership benefits that NIL brings."
Carnegie Mellon Researchers Create New Form of Silicon with Potential for Solar and LEDs
LIGHTimes News Staff
November 20, 2014...While direct band gap materials can effectively absorb and emit light,
indirect band gap materials, like diamond-structured silicon, cannot. A team of
researchers at Carnegie Mellon university headed by Timothy Strobel, have
created a new form of silicon with a quasi-direct band gap that falls within
the desired range for solar absorption. The silicon they created is an
allotrope, a different physical form of the same element. The silicon consists
of a zeolite-type structure that is comprised of channels with five-, six- and
eight-membered silicon rings.
The researchers created the new silicon with a novel high-pressure precursor
process. First, the team produced a compound of silicon and sodium, Na4Si24
under high-pressure. Then, the compound was brought back down to ambient
pressure. Next, it was heated under a vacuum to completely remove the sodium.
According to the researchers, the resulting pure silicon allotrope, Si24, can
absorb, and potentially emit, light far more effectively than conventional
diamond-structured silicon. Si24 is stable at ambient pressure to at least 842
degrees Fahrenheit (450 degrees Celsius).
“High-pressure precursor synthesis represents an entirely new
frontier in novel energy materials,”stated Strobel. “Using
the unique tool of high pressure, we can access novel structures with real
potential to solve standing materials challenges. Here we demonstrate
previously unknown properties for silicon, but our methodology is readily
extendible to entirely different classes of materials. These new structures
remain stable at atmospheric pressure, so larger-volume scaling strategies may
be entirely possible.”
“This is an excellent example of experimental and theoretical
collaboration,” said Kim. “Advanced electronic structure
theory and experiment have converged to deliver a real material with exciting
prospects. We believe that high-pressure research can be used to address
current energy challenges, and we are now extending this work to different
materials with equally exciting properties.”
The research work was supported by DARPA and Energy Frontier Research in
Extreme Environments (EFree), an Energy Frontier Research Center funded by the
U.S. Department of Energy, Office of Science. Portions of the work were
performed at HPCAT, Advanced Photon Source, Argonne National Laboratory. HPCAT
operations are supported by DOE-NNSA and DOE-BES, with partial funding by the
Aixtron Launches AIX R6 for LED Manufacturing
LIGHTimes News Staff
November 11, 2014...At the China SSL international trade fair, Aixtron SE of Herzogenrath
Germany, officially launched the AIX R6 MOCVD system for the production of
gallium nitride (GaN)-based LEDs. San’an previously ordered the system.
The company can deliver the system in 12×6-, 31×4-, 121×2-inch wafer
configurations. Aixtron claims that the new tool will lower operational costs
significantly while simplifying process control and usability. The company
based the AIX R6 design on its Close Coupled Showerhead (CCS) concept. The new
system boasts a more than 30 percent cost of ownership improvement and a
throughput increase of more than 120 percent compared to current generation
“Our new AIX R6 addresses the most important challenges which LED
manufacturers face today: highly competitive markets with consistently
decreasing device prices driving the need for production equipment with lower
cost of ownership. The AIX R6 is designed to fulfill our customers’ needs
for highly efficient production enabling them to optimize their cost of
manufacturing,” said Martin Goetzeler, CEO and president of
Andreas Toennis, chief technology officer at Aixtron, stated, “The
AIX R6 has been developed with a high focus on the customer production needs.
We put great emphasis on maximizing the throughput by greater capacity, more
automation, increased reliability and longer uptime. Improved process control
through enhanced temperature monitoring and control systems is another key
feature of the AIX R6. A new process control system eliminates temperature
variation for increased reproducibility and yield, and also enables shorter
cycle times and fast calibration.”
Nanojoin Selects Veeco MOCVD Systems for LED Production Ramp
LIGHTimes News Staff
October 7, 2014...Veeco Instruments Inc. of Plainview, New York USA, reported that Suzhou
Nanojoin Photonics Co., Ltd. (Nanojoin) has purchased multiple TurboDisc®
MaxBright™ M™ Metal Organic Chemical Vapor Deposition (MOCVD)
Systems. According to Veeco, Nanojoin plans to use the systems for high-volume
production of LEDs for general lighting.
Nanojoin placed the order for Veeco’s MaxBright M MOCVD systems in Q3
of 2014. Nanojoin, a chinese company that develops and produces solid state
lighting products in addition to LED wafers and chips, currently employs both
single and multi-reactor Veeco MOCVD systems in its production fab.
According to Veeco, the MaxBright M offers a compact, modular, design for
improved serviceability. Veeco says that it is about 15 percent smaller, but
has the same yield as the standard MaxBright MOCVD system. The system offers
many layout configuration options to fit various fab spacing requirements, such
as sub-floor storage, which enables more wafer starts per square foot and a
reduced cost of ownership.
“After careful evaluation of all platforms, we have determined
that Veeco’s MOCVD technology provides the unique advantages needed to
successfully ramp LED production,” said Wang Huaibing, general
manager at Nanojoin. “As we look to capitalize on growing adoption of
energy efficient lighting, we required an MOCVD system that is both stable and
productive. Veeco simply has the best platform for high volume
Epistar Qualifies Veeco EPIK700 MOCVD System for High-volume LED Production
LIGHTimes News Staff
September 30, 2014...Veeco Instruments Inc. based in Plainview, New York USA, reported that
Epistar Corporation has successfully evaluated and accepted the new TurboDisc®
EPIK700™ Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition
(MOCVD) system for LED production.
“As the leader in LED technology and commercialization, it is
vital that we continue to push our roadmap to reduce solid state lighting costs
with the most innovative and efficient production solutions
available,” said Dr. MJ Jou, president, Epistar Corporation.
“EPIK’s performance, reliability and production readiness, as
well as the support we received from Veeco during the beta testing phase, fully
met our high manufacturing standards. The seamless recipe transfer from our
installed base of Veeco K465i™ and MaxBright® systems to the EPIK700 is
allowing us to quickly produce production-quality LED devices. In addition, the
EPIK700’s cost of ownership advantage will help reduce our cost per
wafer, making it a highly attractive platform for our future capacity
Veeco claims that its newly launched EPIK700 MOCVD system, which is based on
its TurboDisc technology, enables customers to achieve a cost per wafer savings
of up to 20 percent compared to previous MOCVD systems through increased
productivity, reduced operating expenses, and improved wafer uniformity.
You could own this space...
For information on our plans and to reserve promotion space contact
Send us an email
or call +1 (512) 257-9888